Several lessons from the DPF cleaning machine industry: Wmon mold cleaning machines must have independently developed cleaning equipment and new material technology; At the same time, there are differences in the quality of materials designed and manufactured, as well as diversity in spray painting and printing design structures, providing consumers with different cleaning solutions.
The selection of pollutants also depends on the chemical reactions of the composition, molecular morphology, properties, or structure of the pollutants to determine the stability of the source/phase. According to the physicochemical content of the oil, such as hydrochloric acid, non-toxic and harmless cleaning equipment can also be prepared to prevent rusting;
When the cause of damage is uncertain, it may be due to impurities or damage to the parts, or incorrect inspection of the circuit, making it impossible to determine the cleaning method, or even ineffective. To reduce the impact of external factors, I suggest that you can refer to the following treatment methods.
For ultrasonic cleaning machines, the effective reference method for obtaining ultrasound is the dispersion of the solution, but the organic solvents and steam particles that are self fouling during the process can remove thicker and trace particles, or yeast solvents and heavy metal cleaning can be added with suitable cleaning solvents.
In fact, due to the particularity of ultrasonic applications, plasma cleaning machines are frequently distributed at resonance frequency points (such as 25KHz, 40KHz, 80KHz, 120KHz). Two different processing units are available.
The final film surface produces pollution and promotes the formation of particles, rust spots, etc. These pollution particles not only increase the elasticity of the film, but also easily remove the film layer, sediment, acidic particles, etc. under the action of signal transmission, reducing the formation of the film.
The materials used for plasma are mainly composed of polymer films such as PI: IC, FPO, PM-H, DCT, ITO, SUe or PT, or laser films. The surface of these films usually contains polyhedrons such as PU, PTFE, O2, C-H5, etc. These substrates have excellent hydrophilicity in Japan, fats, yarns, films, and other processes such as grease, wax, oil, grease, or ink. Low temperature plasma activation treatment is an important feature of plasma cleaning equipment, which can be achieved by changing the product structure and material usage And improve the application level of products by processing partial coatings, the processing area of items, and the efficiency of equipment.
Plasma cleaning equipment etching process (PTFE) is a commonly used ion impact method that, under a certain pressure, causes organic materials to collide with metals or organic materials to achieve surface treatment effects. Form a protective film or modify on the surface of the material.
The biggest feature of plasma cleaning machines is that they can handle glass, metals, semiconductors, oxides, and most polymer materials, such as polypropylene, polyester, polyimide, polychloroethane, epoxy, and even polytetrafluoroethylene, regardless of the type of substrate being processed. They can also achieve overall, local, and complex structure cleaning. They are usually converted into power by direct current, and the function of the power source is to provide the required energy to the object. High voltage transfers the processed object to the processing area, causing melting inside the processed object.